纺织学报 ›› 2015, Vol. 36 ›› Issue (09): 65-69.

• 染整与化学品 • 上一篇    下一篇

聚酰胺湿法涂层浆的制备机制及其成膜性能

  

  • 收稿日期:2014-09-24 修回日期:2015-03-18 出版日期:2015-09-15 发布日期:2015-09-14

Preparation mechanism and membrane properties for poly-amide wet coating

  • Received:2014-09-24 Revised:2015-03-18 Online:2015-09-15 Published:2015-09-14

摘要:

聚酰胺湿法涂层是将基布经聚酰胺涂层浆(利用聚酰胺溶解于氯化钙/甲醇溶剂中制备涂层浆)浸渍后,经过凝固浴,在基布上形成一层连续的微孔薄膜。为了制备性能优异的聚酰胺湿法涂层商标布,通过对聚酰胺凝固膜的FT-IR、XRD、DSC的表征以及3D显微镜和SEM的分析,研究其制备机制及成膜性能。结果表明:Ca2+破坏了聚酰胺中的氢键,使其在CaCl2/甲醇溶剂中溶解,且当氯化钙与聚酰胺的质量比为2:1时,聚酰胺与氯化钙的络合性能最好;聚酰胺涂层膜的表面光滑,内层是“蜂窝状”结构,断截面是海绵状不对称的孔型结构,当涂层浆中添加炭黑和染料后,薄膜为黑色,表面分布小孔,光滑度降低,这为开发黑色湿法涂层商标布提供了理论基础。

Abstract:

Poly-amide wet coating is the technique that can generate a continuous micro-porous membrane on the fabric surface after the fabric is solidified from dipping in the coating slurry, which made of dissolving the Poly-amide in CaCl2 / methanol mixed solvent. For the sake of obtaining superior performance on the trademark fabrics by Poly-amide wet coating process, the preparation?mechanism and membrane properties were studied by taking advantage of the infrared spectroscopy (FT-IR), X-ray diffraction (XRD), Differential Scanning Calorimetry (DSC), the 3D microscope and scanning electron microscope (SEM). The results showed that Ca2+ can broke the hydrogen bonds in the poly-amide, so that the solubility of the poly-amide in the CaCl2 / methanol mixed solvent rapidly increases, and the high solubility shows up as excellent complex when the mass ration between poly-amide and CaCl2 reaches to 2:1. The poly-amide membrane has excellent physical characteristics, such as smooth surface, cellular cored structure and spongy asymmetric groove structure in the cross section. When adding carbon black and dye in the coating slurry, the poly-amide?membrane will became black, meanwhile many holes will be distributed on the membrane surface and the membrane get more rough, this meaningful phenomenon lays foundation for exploring new trademark fabrics by black wet coating process as powerful theoretical?basis.

中图分类号: 

  • TS 195. 1
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