Journal of Textile Research ›› 2015, Vol. 36 ›› Issue (04): 87-91.

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Friction resistance and anti-UV properties of electron beam evaporated deposited film on fabrics

  

  • Received:2014-03-18 Revised:2014-08-29 Online:2015-04-15 Published:2015-04-20

Abstract:

A NiCr metallic film was formed on the surface of different fabrics by electron beam evaporation deposition method to prepare flexible materials with anti-ultraviolet (UV) properties. SEM, EDS, and image processing technology were used to compare influence of fiber materials and fabric forming methods on friction resistance stability of electron beam evaporation deposited film. The infouence of coating parameters on friction resistance stability and anti-UV properties were also analyzed. The results show that a uniform film with the metallic appearance is formed on the fiber substrate by the electron beam evaporation deposition method, and the polyester knitted structure is conductive to the improvement of the film friction resistance stability. When the sputtering time is 20 min and the sputtering beam current is 280 mA, the metal film has good bonding strength with the substrate, and can standing for friction of 2 000 times. Moreover, UPF is over 40 after about 2 500 friction cycles, and the film has excellent lasting functionality.

Key words: electron beam evaporation deposition, fiber material, film stability, anti-UV

CLC Number: 

  • TQ153
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