原子层沉积在纺织品表面多功能改性研究进展

doi:10.13475/j.fzxb.20210608908

Abstract

Abstract:

In order to tackle the nano-particle agglomeration, poor film stability, and reduced fiber mechanical strength and flexibility when preparing multifunctional textiles from inorganic nano-films, one route is to treat the textile surface using inorganic nano-films with ultra-thin, high interfacial bonding fastness, and high-stability. This review summarizes the reaction mechanism of atomic layer deposition (ALD) and the unique advantages of preparing inorganic nano-films. The current global research progress in inorganic nano-films deposited by ALD to impart functional properties such as ultraviolet resistance, thermal insulation, antibacterial and structural color on the surface of textiles were reviewed. The advantages and disadvantages of ALD and chemical vapor deposition are compared and analyzed. The challenges and problems of ALD in the application of textile functionalization were summarized. It was pointed out that the preparation of inorganic nano-films by ALD represents an important development direction of multifunctional textiles.

Key words: atomic layer deposition, functional textiles, inorganic nano-film, surface modification, chemical vapor deposition

CLC Number:

TS101

YANG Huiyu, ZHOU Jingyi, DUAN Zijian, XU Weilin, DENG Bo, LIU Xin. Research progress in textile surface multifunctional modification by atomic layer deposition[J].Journal of Textile Research, 2022, 43(09): 195-202.

Figures/Tables 3

Fig.1

Tab.1

Tab.2

References 50

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工艺特点	优势	局限性
自限制表面生长	精确简单的膜厚控制;优异的三维共形性和大面积均匀性;致密无针孔薄膜;较低的生长温度	低生长速率;薄膜具有较低的结晶度或无定形态;多余前驱体的处理和污染环境
交替脉冲输入反应物	避免气相反应,可使用高活性前驱体;单原子层调控;适合界面修饰和多层重叠结构生长	前驱体的种类少、杂质残余
ALD 窗口设计	多种薄膜层制备、掺杂、循环调控	三元和复杂氧化物设计缺乏

影响因素	原子层沉积	化学气相沉积
前驱体	高反应活性;可在基材上交替反应;可接受过量前驱体;反应温度下不可分解	反应活性低;基材表面同时反应;前驱体的用量需控制;沉积温度下可分解
均匀性	由表面化学吸附、自限制反应机制生长决定	由反应室、气流和温度等工艺参数决定
反应速率	较低(纳米级生长)	高(微米级生长)
厚度	取决于反应循环次数	调控工艺参数

Research progress in textile surface multifunctional modification by atomic layer deposition

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